Plasma etching thiab tu cov txheej txheem yog cov kauj ruam tseem ceeb hauv kev tsim khoom semiconductor. Raws li cov txheej txheem nodes nce mus rau 7nm, 5nm, thiab dhau mus, plasma zog ceev tseem nce ntxiv, thiab cov tshuaj lom neeg ua haujlwm ntawm halogen gases (fluorine-raws li thiab chlorine-raws li) nce zuj zus. Thaum etching wafers, cov plasmas no kuj indiscriminately thiab tsis tu ncua corrode tag nrho cov nthuav cov khoom nyob rau hauv lub chamber, nrog rau cov phab ntsa chamber, liners, tsom rings, gas faib daim hlau, viewports, thiab lwm yam. cov khoom. Yog li ntawd, kev tshawb nrhiav cov ntaub ntawv uas muaj kev tiv thaiv ntau dua rau cov ntshav plasma corrosion tau dhau los ua qhov xav tau ceev hauv thaj chaw ntawm cov khoom siv semiconductor. Yttrium oxide (Y₂O₃) ua lub luag haujlwm hloov tsis tau hauv qhov chaw no.
Vim li cas yttrium oxide irreplaceable nyob rau hauv semiconductor khoom?
Hauv cov khoom siv semiconductor, aluminium oxide (Al₂O₃) yog cov khoom siv feem ntau siv cov khoom siv ceramic. Nws muaj qhov melting point ntawm 2050 degree, siab txhua yam muaj zog, siab hnav tsis kam, zoo hluav taws xob rwb thaiv tsev, thiab zoo tshuaj stability. Txawm li cas los xij, daim ntawv cog lus lub zog ntawm Al-O daim ntawv cog lus yog txog 498 kJ / mol. Txawm hais tias nws tawm tsam cov tshuaj lom neeg feem ntau, nyob rau hauv siab - lub zog plasma tej yam kev mob nws nkag siab nrog cov tshuaj fluorine los ua ib qho flaky, yooj yim spalled fluoride txheej (AlF₃). Cov txheej no tso thiab crystallizes rau ntawm qhov chaw, tsim cov khoom uas tshem tawm thiab kis kab mob wafers, thaum tsis tu ncua siv cov txheej txheem tiv thaiv.
Nyob rau hauv sib piv, yttrium oxide (Y₂O₃) muaj ib tug cubic siv lead ua system thiab ib tug melting point siab txog 2430 degree. Ntxiv rau qhov zoo tshaj plaws hluav taws xob rwb thaiv tsev thiab optical transparency, nws lub zog Y-O daim ntawv cog lus yog siab li 780 kJ / mol. Nws nthuav tawm cov tshuaj tsis tshua muaj tshuaj tiv thaiv nrog halogens (tshwj xeeb tshaj yog F thiab Cl). Thaum nws hnov mob nrog cov tshuaj fluorine, nws tsim muaj ntau qhov ruaj khov thiab ntom ntom YF₃ txheej uas tsis ua rau spilling. Qhov no tsis tsuas yog txo cov khoom tsim tawm tab sis kuj tseem tiv thaiv kev tawm tsam ntxiv los ntawm cov tshuaj fluorine plasma ntawm cov khoom siv (xws li etching chamber phab ntsa, da dej, thiab lwm yam), txuas ntxiv kev pab cuam lub neej. Nyob rau hauv ib txwm muaj siab - ntom fluorine-raws li lossis chlorine-raws li plasma ib puag ncig, tus nqi ntawm Y₂O₃ feem ntau tsuas yog 1/20 txog 1/50 ntawm Al₂O₃. Tsis tas li ntawd, Y₂O₃ muaj qhov melting point ntawm 2430℃thiab tuaj yeem tswj cov qauv kev ntseeg siab ntawm qhov kub siab tshaj 1750℃yam tsis muaj volatilization lossis deformation, yoog rau qhov kub thiab txias ntawm cov txheej txheem plasma. Nws qhov ntim resistivity siab tshaj 10¹² Ω·cm, nrog qhov tsis tshua muaj dielectric poob, ua kom muaj kev ruaj ntseg ntawm siab - zaus RF teb thiab zam cov txheej txheem sib txawv los ntawm cov khoom tsis zoo ntawm cov khoom siv.
Kev siv yttrium oxide hauv cov khoom siv semiconductor
Raws li cov khoom tseem ceeb ntawm yttrium oxide thiab ua ke nrog cov kev cai tshwj xeeb ntawm cov khoom siv sib txawv ntawm cov khoom siv semiconductor, nws cov ntawv thov hauv thaj chaw semiconductor feem ntau muab faib ua plaub pawg:
01 Yttrium oxide txheej
Vim tias yttrium oxide, raws li cov khoom siv hauv ntiaj teb tsis tshua muaj, kuj tseem kim, feem ntau cov khoom siv etching los yog cov khoom siv tsis siv cov ntshiab Y₂O₃ ceramics. Hloov chaw, Y₂O₃ txheej tuab nrog lub thickness ntawm 100-300 μm yog tso rau saum npoo ntawm aluminium alloy los yog Al₂O₃ substrates (xws li chamber liners, tsom rings, roj faib phaj, thiab lwm yam) siv cov tswv yim xws li plasma spraying los yog lub cev vapor deposition (PVD). Qhov no yog tam sim no feem ntau siv daim ntawv ntawm yttrium oxide txheej hauv cov khoom siv semiconductor. Txoj hauv kev no sib npaug lub zog ntawm cov khoom siv hauv paus nrog qhov kev tiv thaiv corrosion ntawm Y₂O₃, thaum txo cov nqi. Hauv cov txheej txheem siab tshaj ntawm 7nm thiab hauv qab no, yttrium oxide coatings tau maj mam dhau los ua kev lag luam tus qauv kev tiv thaiv kev teeb tsa, txuas ntxiv lub voj voog loj ntawm cov khoom siv etching los ntawm ob peb puas teev mus rau ntau tshaj li ib txhiab teev, thaum txo cov kab mob sib kis thiab txhim kho cov khoom siv uptime thiab wafer tawm los.
02 Pob tshab yttrium oxide viewports
Viewports ntawm semiconductor plasma cov cuab yeej yog cov khoom tseem ceeb rau kev saib xyuas cov txheej txheem thiab ua kom cov txheej txheem raug. Lawv yuav tsum tsis tsuas yog cov ntshav plasma corrosion kuj zoo xwb tab sis kuj zoo optical transparency tso cai rau cov tswv kom meej meej soj ntsuam wafer ua nyob rau hauv lub chamber. Cov ntaub ntawv pob tshab xws li quartz iav thiab alumina tau yooj yim corroded hauv fluorine-raws li cov plasma ib puag ncig, ua rau nto roughening, txo transmittance, thiab tsis muaj peev xwm ua tau raws li qhov ntev - siv sijhawm ntev. Pob tshab yttrium oxide ceramics muaj qhov sib kis ntau yam npog ultraviolet mus rau infrared (0.29-8 μm), nrog txog 80% linear transmittance txawm nyob deb - thaj tsam infrared. Ua ke nrog lawv cov plasma corrosion kuj zoo heev, lawv tuav lub ntsej muag huv si thiab ruaj khov pob tshab txawm tias tom qab ntev - siv cov tshuaj fluorine-raws li thiab chlorine-raws li plasma ib puag ncig, ua tsis muaj cov khib nyiab corrosive lossis crystalline impurities, yog li ua kom ob qho tib si kev soj ntsuam zoo thiab tsis txhob wafer.
03 Yttrium oxide composite ceramic Cheebtsam
Vim lub zog tsis tshua muaj zog, siab sintering nyuaj, thiab tus nqi siab ntawm cov ntshiab yttrium oxide ceramics, kev lag luam feem ntau siv doped yttrium oxide-raws li cov khoom siv ceramics kom sib npaug ntawm cov kev xav tau thiab cov nqi -effectiveness. Piv txwv li, yttrium aluminium garnet (YAG), tsim los ntawm doping yttrium oxide nrog ib qho kev faib ua feem ntawm txhuas oxide, kuj muaj ib tug cubic siv lead ua qauv thiab ruaj khov tshuaj. Nws tsis nkag mus rau cov tshuaj lom neeg muaj zog nrog cov pa roj hauv cov ntshav (xws li fluorine, chlorine, thiab lwm yam halogens). Hauv cov tshuaj fluorine- uas muaj cov plasma ib puag ncig, piv rau cov ntaub ntawv zoo li Al₂O₃, nws tsim cov khoom siv fluoride tsawg dua, txo cov kab mob sib kis thiab qhov chaw corrosion. Nyob rau tib lub sijhawm, piv rau cov ntshiab yttrium oxide ceramics, YAG muaj zog dua (Mohs hardness 8-8.5) thiab cov khoom siv zoo heev, ua rau nws tsim nyog rau cov khoom siv nrog qee qhov kev xav tau ntawm lub zog hauv etchers, thiab nws kuj tuaj yeem siv los ua qhov pom kev pom.